Researchers have designed a robust image-based anomaly detection (AD) framework with illumination enhancement and noise suppression features that can enhance the detection of subtle defects in ...
“Semiconductor lithography inspection requires reliable detection of small pattern defects such as bridge, burr, pinch, and contamination. In this study, we propose a two-stage vision-language ...
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Image-based model enhances the detection of surface defects in low-light industrial settings
In industry, the detection of anomalies such as scratches, dents, and discolorations is crucial to ensure product quality and safety. However, conventional methods rely on heavy computational ...
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