At the forefront of Europe’s photonics innovation, TNO is building a state-of-the-art pilot line for Indium Phosphide (InP) photonic chips at the High Tech Campus in Eindhoven. As part of the ...

Huawei has confirmed in a posting on its website reports about its breakthrough in making a light source component used in EUV lithography systems which are required for making high-end processors on ...

Canon launched its Nanoimprint Lithography semiconductor manufacturing equipment, which has the potential to compete with ASML's EUV technology currently in production at 4nm. Canon's first planned ...

Continued scaling of integrated circuits to smaller dimensions is still a viable way to increase compute power, achieve higher memory cell density, or reduce power consumption. These days, chip makers ...

TOKYO, Oct. 1, 2025 /PRNewswire/ -- Nikon Corporation is reaffirming the availability of its Digital Lithography System, DSP-100, with orders having commenced in July 2025. This system is specifically ...

LEUVEN, Belgium — This week, at SPIE 2023 Advanced Lithography + Patterning Conference, in San Jose, CA, imec, a world-leading research and innovation hub in nanoelectronics and digital technologies, ...

2019 marked an important milestone for extreme ultraviolet (EUV) lithography. In that year, the EUV patterning technology was for the first time deployed for the mass production of logic chips of the ...

MELVILLE, N.Y., April 8, 2021 /PRNewswire/ — Canon U.S.A., Inc., a leader in digital imaging solutions, today announced that its parent company, Canon Inc., has launched the FPA-5520iV LF Option for ...