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3:51
YouTube
Intel Newsroom
Intel Adds ASML’s First High NA EUV Tool to Oregon Factory
ASML’s High Numerical Aperture (High NA) Extreme Ultraviolet (EUV) lithography scanner sits in Intel Oregon’s D1X test manufacturing factory, where it is going through its final calibration. It is as big as a double-decker bus and weighs as much as a blue whale. It will shoot lasers at light speed and heat plasma to nearly 220,000 degrees ...
187.8K views
Apr 18, 2024
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